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PECVD graphite boat is a high-purity precision graphite carrier dedicated to tubular PECVD equipment for photovoltaic and semiconductor production. It is not merely a wafer holder; it acts as an electrode to maintain stable plasma discharge during the SiNx anti-reflection and passivation film deposition process. The spacing between wafer slots, surface flatness and graphite purity directly determine film uniformity, color difference and cell conversion efficiency.
It adopts fine-grain high-density graphite raw material, featuring low ash content, good electrical conductivity, excellent thermal shock resistance and low gas release under vacuum. It can withstand repeated heating and cooling cycles in plasma environment, resisting corrosion by silane, ammonia and other process gases. Reasonable slot structure reduces wafer sticking, edge over-coating and fragment risk.
Jiecheng Graphite customizes PECVD graphite boats for different wafer sizes and equipment models. We control slot tolerance, parallelism and surface finish strictly. Surface coating treatment is optional to reduce silicon adhesion and extend service life. With 22 years of graphite machining experience, we can match designs for mainstream PECVD furnace brands.
